Film / Photomask / Reticle Inspection system

TSL-EX4

Application

Inspect defects on the film/ photomask by optical lens capturing system. The inspection system can reduce damages and promote product quality.

Performance

Inspection time：
    < 90sec 5 µm/pixel (Inspection area：500 x 400mm)
Inspection ability：
  • Min. line /space width : Down to 40µm
  • Min. defects size : 12 µm
  • System Resolution : 5um
Inspection mode(Design Rule Check)：
  • To determine defect by user's parameters and system embedded logic.
  • Simple for operation and no need reference required.
  • Inspect irregular broken/connection, pinhole, dirt, protrusion, violate minimum line/space width etc.
Easy Parameter Setting：
    Automatic core parameter, Dust Sweep, Ignore Blank Area, Skip Model, etc.
What You See Is What You inspect：
    When parameter or image changed, system will update new defect detected results and display.
Review on Fly：
  • You do not need waiting scanning finished for review, when the system start scanning you can star review the defects in the same time.
  • From scan to review equal 0 second.
  • Preview various defect images at the same time. Different from “Review must be waiting for scanning finished” Effectively reduce staff waiting time.
Measurement：
    Line width, Space width, Circular, Rectangle, Rotated Rectangle, Central distance, Gap Distance, Long Distance.
Real-time multi-language：
    Change the language does not need to restart the software, suitable for multi-language environment. (Traditional Chinese, Simplified Chinese, English, Japanese)
Computer Backup Systems：
    Dual hard disk / dual operating system to quickly resolve system exceptions, real time switch, the system does not halt.
Automatic Stamp function：
    Marking the defect location on film

OverviewSpecial FunctionInspection abilityModel Comparison

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