Film / Photomask / Reticle Inspection system


Inspection ability

Design Rule Check

To determine defect by user's parameters and system embedded logic. Simple for operation and no need reference required. Inspect irregular broken/connection, pinhole, dirt, protrusion, violate minimum line/space width etc.

Easy to Use

Locate the photomask and start and end position then one click hot key for starting inspection.

Easy to Control

When parameter or image changed, system will update new defect detected results and display. What you see is what you inspect.

Ignore blank area

When parameter or image changed, system will update new defect detected results and display. What you see is what you inspect.

Dust sweeping

To avoid false defect which are made on purpose.

Skipped model verification

To avoid false defect which are made on purpose.

Data Reference

Data reference:To compare captured image with reference data. We emphasized that lost PAD on the photomask, image shifted and change of pattern size.

Raster data reference

Can inspection defects, such as shift PAD, bigger aperture, smaller aperture, miss aperture or additional aperture

Vector data reference

Enhance to Inspect the protrusion on circuit.

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