Film / Photomask / Reticle Inspection system


Model Comparison

【 Introduction 】

Model TSL-FVT-EX4 TSL-FVT-DX6.0 TSL-FVT-DX6.5 TSL-FVT-DX6 Super TSL-FVT-DX6 Super high TSL-FVT-DX6 Super high plus TSL-SP7-LS3 TSL-SP7-LS2
Inspection Object Film Film / Photomask / Reticle Film / Photomask / Reticle Photomask / Reticle Photomask / Reticle Photomask / Reticle Photomask / Reticle Photomask / Reticle
Minimum line/space width 40 um↑ 15 um↑ 15 um↑ 8.5 um↑ 6.5 um↑ 4.5 um↑ 3 um↑ 2 um↑
Minimum defect detection capability 12 um 5 um 5 um 3 um 2 um 1.5 um 1 um 0.75 um
Type of defect Broken line, Pin hole, Dirt, Scratch, Circuit nick, Water Stain Shade.
DRC mode
Data Reference mode
Review on Fly
Max. object size(mm) Film840*665 Film945*790
Photomask / Reticle800*700
Film945*790
Photomask / Reticle800*700
Photomask / Reticle800*700 Photomask / Reticle800*700 Photomask / Reticle800*700 Photomask / Reticle800*700 Photomask / Reticle800*700
Inspection area(mm) Film700*600 Film880*700
Photomask / Reticle750*650
Film 880*700
Photomask / Reticle750*650
Photomask / Reticle750*650 Photomask / Reticle750*650 Photomask / Reticle750*650 Photomask / Reticle750*650 Photomask / Reticle750*650

【 Inspection time 】
(Inspection area 500mm X 400mm)
機型 TSL-FVT-EX4 TSL-FVT-DX6.0 TSL-FVT-DX6.5 TSL-FVT-DX6 Super TSL-FVT-DX6 Super high TSL-FVT-DX6 Super high plus TSL-SP7-LS3 TSL-SP7-LS2
Wait for review 0 sec 0 sec 0 sec 0 sec 0 sec 0 sec 0 sec 0 sec
Inspection time < 90 sec < 35 sec < 35 sec < 10 min < 17 min < 50 min < 50 min < 50 min
Resolution 5 um/pixel 5 um/pixel 5 um/pixel 0.84 um/pixel 0.63 um/pixel 0.36 um/pixel

【 System architecture description 】

機型 TSL-FVT-EX4 TSL-FVT-DX6.0 TSL-FVT-DX6.5 TSL-FVT-DX6 Super TSL-FVT-DX6 Super high TSL-FVT-DX6 Super high plus TSL-SP7-LS3 TSL-SP7-LS2
Dimensions/Weight W1500*D1500*H1600(mm) / about 780 kg W1450*D1650*H1600(mm) / about 1000kg
Power 220 volt 1 phase 750W(Rated) 1KW(Peak) with Ground Wire
Photomask holder Option Option Option standard standard standard standard standard
Autofocus
Work station
Remark
  • To adopt all functions of DX6.0 plus Data Reference
  • Individual work station for preparation of reference data.
  • Focus on high end photomask
  • DRC+Data Reference.
  • Autofocus can overcome defocus issue and take clear image.
  • Focus on high end photomask
  • DRC+Data Reference.
  • Autofocus can overcome defocus issue and take clear image.
  • Focus on high end photomask
  • DRC+Data Reference.
  • Autofocus can overcome defocus issue and take clear image.
  • Focus on high end photomask
  • DRC+Data Reference.
  • Autofocus can overcome defocus issue and take clear image.
  • Focus on high end photomask
  • DRC+Data Reference.
  • Autofocus can overcome defocus issue and take clear image.