Film / Photomask / Reticle Inspection system

Special Function

The films or photomask used in the lithography process are not allowed to have any defects that affect the final product and we use the automatic optical inspection system to inspect many kind of defects on the film / mask. And through the system to set the most consistent testing standards to reduce the negative film / mask caused by the scrapped and lost to enhance product quality.

Real-time parameter react

When parameter or image changed, system will update new defect detected results and display. No need to re-scan process.

What You See Is What You Inspect

The embedded review system, you do not need a standalone review system, every image you see is the same image in inspection. This can reduce the risk of missing review.

Measurement

Provide measurement tools for circular, line width, space width, rectangle, central distance and long distance.

Review On Fly

You do not need waiting scanning finished for review, when the system start scanning you can star review the defects in the same time.
From scan to review equal 0 second.
Preview various defect images at the same time. Different from ”Review must be waiting for scanning finished” Effectively reduce staff waiting time.

Defect Image Saving

Output data supported (JPG、BMP、PNG、TIFF、TZP) format. All defect images will be saved.

Real-time multi-language

Change the language does not need to restart the software, suitable for multi-language environment. (Traditional Chinese, Simplified Chinese, English, Japanese)

Conversion film/photomask to GerberData (Reverse engineering)

It is possible scanned film/photomask to generate Vector Image in Gerber Format(RS-274X).